ALD2019 Monday Afternoon

Sessions | Time Periods | Topics | Schedule Overview

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Session Monday, July 22, 2019
1:30 PM 2:30 PM 3:30 PM 4:30 PM 5:30 PM
Atomic Layer Deposition on Pharmaceutical Particles for Inhaled Drug Delivery
The Use of Atomic Layer Deposition to Increase the Availability of Medical Radio-Isotopes
Atomic Layer Deposition for Biosensing Applications
Multi-layer Stacked ALD Coating for Hermetic Encapsulation of Implantable Biomedical Microdevices
Modification of Spaceflight Radiator Coating Pigments by Atomic Layer Deposition for Thermal Applications
Novel Atomic Layer Deposition Process/Hardware for Superconducting Films for NASA Applications
Fluoride-based ALD Materials System for Optical Space Applications
Atomic Layer Deposition of Aluminum Fluoride for use in Astronomical Optical Devices
Nucleation Layer for Atomic Layer Deposition Enabling High Efficiency and Flexible Monolithic All-Perovskite Tandem Solar Cells
Perovskite Solar Cells Fabricated using Atomic Layer Deposited Doped ZnO as a Transparent Electrode
Metal Oxide Barrier and Buffer Layers by Atomic Layer Deposition and Pulsed-Chemical Vapor Deposition for Semi-Transparent Perovskite Solar Cells
Particle Atomic Layer Deposition of Tungsten Nitride Environmental Barrier Coatings from Bis(t-butylimido)bis(dimethylamino)tungsten(VI) and Ammonia
Atomic Layer Deposition on Mg(BH4)2: A Route to Improved Automotive H2storage
Plasmonic Mediated Hydrogen Desorption from Metal Hydrides
Surface Modification of Solid Oxide Fuel Cell Cathodes by Atomic Layer Deposition
Hybrid Computational Fluid Dynamics / Machine Learning Approaches to Reactor Scale Simulations and Optimization of ALD, ALEt, and LPCVD Processes
Scalable Kinetic Monte-Carlo Model for Parasitic Reactions in Silicon Nitride Growth using 3DMAS Precursor
Diffusion and Aggregation in Island-Growth and Area-Selective Deposition
Surface Kinetics in ALD and ALE: Computing the Cooperative Effect by Automated Enumeration of Reaction Pathways with Spectator Adsorbates
An Immiscible Fluids Approach for Correctly Predicting Agglomerate Dynamics during Particle Atomic Layer Deposition (Particle ALD)
The Time-Resolved Interface between ALD and CVD
The Materials Supplier Challenge: Flawless Execution from Precursor Design to High Volume Manufacturing
Precursor and Co-Reactant Selection: A Figure of Merit
Designing Thermal Atomic Layer Deposition Processes for Gold Metal using New Organogold Precursors and Co-reageants
A New Carbene Based Silver Precursor Applied in APP-ALD Yielding Conductive and Transparent Ag Films: A Promising Precursor Class for Ag Metal ALD
Transition Metal β-ketoiminates: A Promising Precursor Class for Atomic Layer Deposition of Binary and Ternary Oxide Thin Films
A New and Promising ALD Process for Molybdenum Oxide Thin Films: From Process Development to Hydrogen Gas Sensing Applications
Atomic Layer Deposition of Gallium Oxide Thin Films using Pentamethylcyclopentadienyl Gallium and Combinations of H2O and O2 Plasma
Understanding Elemental Steps of ALD on Oxidation Catalysts
Advanced Lateral High Aspect Ratio Test Structures for Conformality Characterization by Optical Microscopy
Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS
Metallic Ruthenium Coating on SiO2 Powder by Atomic Layer Deposition using H2O Reactant.
Low Energy Ion Scattering Study of Pt@Al2O3 Nanoparticle Coarsening
Physical and Electrical Characterization of ALD Chalcogenide Materials for 3D Memory Applications
The Tailoring of the Single Metal Atom-Oxide Interface
Monolithic Integration of Single Crystal Perovskites on Semiconductors with ALD
Introducing the Concept of Pulsed Vapor Phase Copper-free Surface Click-chemistry using the ALD Technique
Surface Enhanced Raman Spectroscopy Studies of Aluminum ALD Precursors for Al2O3 Growth
Atomic Layer Deposition of Aluminum, Hafnium and Zirconium Oxyfluoride Films with Tunable Stoichiometry
Fundamental Study on the SiO2 Growth Mechanism of Electronegativity Difference of Metal-O in the High-k Underlayers by PE-ALD Method
Low Temperature Aluminium Nitride Deposition: Comparing Hydrazine and Ammonia
Atomic Layer Etching – Advancing Its Application with a New Regime
Control of the Interface Layer in ALE Process by Alternating O2 Plasma with Fluorocarbon Deposition for High Selectivity Etching
Self-limiting Atomic Layer Etching of SiO2 using Low Temperature Cyclic Ar/CHF3 Plasma
Evolution of Photoresist Layer Structure and Surface Morphology in a Fluorocarbon-Plasma-Based Atomic Layer Etching Process
Optimized Radical Composition of C4F8/Ar Plasma to Improve Atomic Layer Etching of SiO2
Atomic Layer Etching of Silicon Nitride with Ultrahigh Etching Selectivity over Silicon and Oxide Materials by Utilizing Novel Etch Gas Molecule
Atomic Layer Etching at Low Substrate Temperature
Developments of Atomic Layer Etch Processes and their Applications in Fabricating III-V Compound Semiconductor Devices
GaN and Ga2O3 Thermal Atomic Layer Etching Using Sequential Surface Reactions
Selective GaN Etching Process using Self-limiting Cyclic Approach for Power Device Applications
ALE of GaN (0001) by Sequential Oxidation and H2/N2 Plasma
Comparative Study of Two Atomic Layer Etching Processes for GaN
Chlorinated Surface Layer of GaN in Quasi Atomic Layer Etching of Cyclic Processes of Chlorine Adsorption and Ion Irradiation
Sessions | Time Periods | Topics | Schedule Overview