Atomic Layer Deposition on Pharmaceutical Particles for Inhaled Drug Delivery

The Use of Atomic Layer Deposition to Increase the Availability of Medical Radio-Isotopes

Atomic Layer Deposition for Biosensing Applications

Multi-layer Stacked ALD Coating for Hermetic Encapsulation of Implantable Biomedical Microdevices

Modification of Spaceflight Radiator Coating Pigments by Atomic Layer Deposition for Thermal Applications

Novel Atomic Layer Deposition Process/Hardware for Superconducting Films for NASA Applications

Fluoride-based ALD Materials System for Optical Space Applications

Atomic Layer Deposition of Aluminum Fluoride for use in Astronomical Optical Devices

Nucleation Layer for Atomic Layer Deposition Enabling High Efficiency and Flexible Monolithic All-Perovskite Tandem Solar Cells

Perovskite Solar Cells Fabricated using Atomic Layer Deposited Doped ZnO as a Transparent Electrode

Metal Oxide Barrier and Buffer Layers by Atomic Layer Deposition and Pulsed-Chemical Vapor Deposition for Semi-Transparent Perovskite Solar Cells

Particle Atomic Layer Deposition of Tungsten Nitride Environmental Barrier Coatings from Bis(t-butylimido)bis(dimethylamino)tungsten(VI) and Ammonia

Atomic Layer Deposition on Mg(BH₄)₂: A Route to Improved Automotive H₂storage

Plasmonic Mediated Hydrogen Desorption from Metal Hydrides

Surface Modification of Solid Oxide Fuel Cell Cathodes by Atomic Layer Deposition

Hybrid Computational Fluid Dynamics / Machine Learning Approaches to Reactor Scale Simulations and Optimization of ALD, ALEt, and LPCVD Processes

Scalable Kinetic Monte-Carlo Model for Parasitic Reactions in Silicon Nitride Growth using 3DMAS Precursor

Diffusion and Aggregation in Island-Growth and Area-Selective Deposition

Surface Kinetics in ALD and ALE: Computing the Cooperative Effect by Automated Enumeration of Reaction Pathways with Spectator Adsorbates

An Immiscible Fluids Approach for Correctly Predicting Agglomerate Dynamics during Particle Atomic Layer Deposition (Particle ALD)

The Time-Resolved Interface between ALD and CVD

The Materials Supplier Challenge: Flawless Execution from Precursor Design to High Volume Manufacturing

Precursor and Co-Reactant Selection: A Figure of Merit

Designing Thermal Atomic Layer Deposition Processes for Gold Metal using New Organogold Precursors and Co-reageants

A New Carbene Based Silver Precursor Applied in APP-ALD Yielding Conductive and Transparent Ag Films: A Promising Precursor Class for Ag Metal ALD

Transition Metal β-ketoiminates: A Promising Precursor Class for Atomic Layer Deposition of Binary and Ternary Oxide Thin Films

A New and Promising ALD Process for Molybdenum Oxide Thin Films: From Process Development to Hydrogen Gas Sensing Applications

Atomic Layer Deposition of Gallium Oxide Thin Films using Pentamethylcyclopentadienyl Gallium and Combinations of H₂O and O₂ Plasma

Understanding Elemental Steps of ALD on Oxidation Catalysts

Advanced Lateral High Aspect Ratio Test Structures for Conformality Characterization by Optical Microscopy

Dopant Concentration Analysis of ALD Thin Films in 3D Structures by ToF-SIMS

Metallic Ruthenium Coating on SiO₂ Powder by Atomic Layer Deposition using H₂O Reactant.

Low Energy Ion Scattering Study of Pt@Al₂O₃ Nanoparticle Coarsening

Physical and Electrical Characterization of ALD Chalcogenide Materials for 3D Memory Applications

The Tailoring of the Single Metal Atom-Oxide Interface

Monolithic Integration of Single Crystal Perovskites on Semiconductors with ALD

Introducing the Concept of Pulsed Vapor Phase Copper-free Surface Click-chemistry using the ALD Technique

Surface Enhanced Raman Spectroscopy Studies of Aluminum ALD Precursors for Al₂O₃ Growth

Atomic Layer Deposition of Aluminum, Hafnium and Zirconium Oxyfluoride Films with Tunable Stoichiometry

Fundamental Study on the SiO₂ Growth Mechanism of Electronegativity Difference of Metal-O in the High-k Underlayers by PE-ALD Method

Low Temperature Aluminium Nitride Deposition: Comparing Hydrazine and Ammonia

Atomic Layer Etching – Advancing Its Application with a New Regime

Control of the Interface Layer in ALE Process by Alternating O₂ Plasma with Fluorocarbon Deposition for High Selectivity Etching

Self-limiting Atomic Layer Etching of SiO₂ using Low Temperature Cyclic Ar/CHF₃ Plasma

Evolution of Photoresist Layer Structure and Surface Morphology in a Fluorocarbon-Plasma-Based Atomic Layer Etching Process

Optimized Radical Composition of C4F8/Ar Plasma to Improve Atomic Layer Etching of SiO₂

Atomic Layer Etching of Silicon Nitride with Ultrahigh Etching Selectivity over Silicon and Oxide Materials by Utilizing Novel Etch Gas Molecule

Atomic Layer Etching at Low Substrate Temperature

Developments of Atomic Layer Etch Processes and their Applications in Fabricating III-V Compound Semiconductor Devices

GaN and Ga₂O₃ Thermal Atomic Layer Etching Using Sequential Surface Reactions

Selective GaN Etching Process using Self-limiting Cyclic Approach for Power Device Applications

ALE of GaN (0001) by Sequential Oxidation and H₂/N₂ Plasma

Comparative Study of Two Atomic Layer Etching Processes for GaN

Chlorinated Surface Layer of GaN in Quasi Atomic Layer Etching of Cyclic Processes of Chlorine Adsorption and Ion Irradiation