ALD2017 Tuesday Morning
Sessions | Time Periods | Topics | Schedule Overview
Hover over a paper or session to view details.
Click a Session in the first column to view session papers.
| Session | Tuesday, July 18, 2017 | |||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| 8:00 AM | 9:00 AM | 10:00 AM | 11:00 AM | |||||||||||||
| AA-TuM |
Designing of Surface and Interface of Electrodes for Highly-stable Li Ion Batteries, Li-S Batteries and Metal-Air Batteries
|
ALD Vanadium Oxides for 3D Thin-film Lithium Ion Batteries
|
PE-ALD of Transition Metal Phosphates as Lithium-Ion Battery Electrode Materials
|
Comparing Temporal and Spatial Atomic Layer Deposition for Enhanced Performance of Li Ion Battery Electrodes
|
All-Solid-State Thin-Film Battery with a Novel Organic Cathode Material by Atomic/Molecular Layer Deposition
|
Atomic Layer Deposition of Hierarchical CNTs@FePO4 Architecture as a 3D Electrode for Lithium-Ion and Sodium-Ion Batteries
|
Unravelling The Role of ALD Al2O3 and TiO2 Protective Coatings on Lithium-Ion Battery Electrodes.
|
Coffee Break & Exhibits
|
ALD Layer Opportunties for Reversible Bonding of Ultrathin Glass Substrates
|
Atomic Layer Deposition and Precursor Development for Chemoresistive Gas Sensing Materials
|
Physics with and Physics of Atomic Layer Deposited Nanofilms
|
Highly Resistive ALD Coatings for Microchannel Plates Operating at Cryogenic Temperatures
|
Reactions on ALD TiO2, ZnO, and Al2O3 Metal Oxides during Nucleation of UiO-66-NH2 MOF Thin Films as Hydrolysis Catalysts for Chemical Warfare Agent Simulants.
|
|||
| AA+ |
Functional Materials using Atomic Layer Deposition for Emerging Display Applications
|
Flexible Platinum Nanoparticle-based Piezoresistive Transducers Elaborated by Atomic Layer Deposition
|
Color Coating of Electronic Textiles via Control of Refractive Index by Atomic Layer Deposition
|
Comprehensive Studies of Atomic Layer Deposited InGaO Thin Films using InCA-1, TMGa and H2O2 for Oxide Semiconductor Thin Film Transistor Applications
|
Highly Sensitive VOCs Sensor Based on Atomic Layer Deposition of TiO2 on Carbon Nanotubes
|
Coffee Break & Exhibits
|
In-situ Real-time and in-vacuo Study of the Temperature Impact on the Al2O3 ALD Nucleation upon Pristine Monolayer Graphene
|
Investigation of the Influence of Plasma Parameters During Aluminum Nitride Atomic Layer Epitaxy using Grazing Incidence Small Angle X-ray Scattering
|
Studies of Surface Structure and Surface Chemistry During Plasma-Assisted Atomic Layer Epitaxial Growth of InN Semiconductor Thin Films on GaN Substrates
|
Plasma Gas Chemistry Influence on Growth of InN Films by Atomic Layer Epitaxy
|
Spectroscopic Ellipsometry of WO3 Thin Films from ALD: In-situ Layer-by-Layer Growth Monitoring and ex-situ Optical Characterization
|
|||||
| AF1-TuM |
Photo-assisted ALD of Oxides and Metals
|
Oxidation State Discrimination in the Atomic Layer Deposition of Vanadium Oxides
|
Controlled B Doping in ZnO Atomic Layer Deposition using Boric Acid in Methanol as the B Source
|
Atomic Layer Deposition of Cobalt(II) Oxide/Hydroxide Thin Films
|
High Purity Indium Oxide Films Prepared by Modified ALD using Liquid Ethylcyclopentadienyl Indium
|
A New Scandium Precursor for the ALD of Scandium Oxide
|
ALD Y2O3 Film Using Liquid Yttrium Precursor and Water
|
Coffee Break & Exhibits
|
Thermal ALD of Gold Thin Films
|
Nucleation Behavior of Ru on SiO2 by Atomic Layer Deposition Using Cyclopentadienylethyl(dicarbonyl)Ruthenium and Oxygen
|
Mechanistic Aspects of Ru ALD Based on Ru(DMBD)(CO)3 using Downstream Quadrupole Mass Spectrometry
|
Atomic Layer Deposition for Rhenium Based Materials
|
Plasma-enhanced Atomic Layer Deposition of Silver using the Ag(fod)(PEt₃)-precursor and NH₃-plasma
|
|||
| AF2-TuM |
Tuning Material Properties by Ion Energy Control during Remote Plasma-ALD on Planar and 3D Substrates
|
Stress Control of Plasma ALD Films Deposited at Low Temperature by Application of Substrate Biasing
|
Benefits of an O2 Plasma in a Bi2O3 ALD Process
|
High Quality Thin Films Produced by Innovative PEALD Equipment with Microwave ECR Plasma
|
ALD of Aluminum Fluoride using Al(CH3)3 and SF6 Plasma
|
Ferroelectricity in Undoped ZrO2 Thin Films on Pt Electrode without Post-Annealing Treatment
|
Improving the Conductivity (<10-3 Ω cm) of HfNx by Ion Energy Control during Plasma-assisted ALD
|
Plasma Technology for Spatial ALD of Conductive Layers
|
Coffee Break & Exhibits
|
Atomic Layer Deposition of Lithium Titanate on Planar and 3D-Structured 200 mm Silicon Substrates
|
Nano-ceramic Composite Separator Modified by ALD for Lithium Ion Batteries of Improved Safety and Reliability
|
Physical and Electrical Characteristics of ALD Tin Disulfide Multilayer
|
PEALD Platinum Nano-island SET Fabrication and Electrical Characterization
|
Thermal Annealing Effects on Electron Emission Properties of ALD MgO
|
||