ICMCTF2001 Session B2-1: CVD Hard Coatings and Technologies

Wednesday, May 2, 2001 8:30 AM in Room Town & Country

Wednesday Morning

Time Period WeM Sessions | Abstract Timeline | Topic B Sessions | Time Periods | Topics | ICMCTF2001 Schedule

Start Invited? Item
8:30 AM B2-1-1 CVD Oxides Mechanisms,Characterisation, Applications and Much Else
M.L. Hitchman (University of Strathclyde, United Kingdom)
Oxide coatings are of interest for a variety of applications. For example, they can be used as high quality dielectric layers, as high temperature superconductors (HTS), for precision optics and telecommunications, for catalytic processes, and for hard films and protection applications. CVD is a versatile technique capable of producing high quality coatings for all these different applications. In this presentation the preparation and characterisation of a range of oxides by CVD will be described. In particular, mechanistic studies of the decomposition of -diketonates as precursors for the synthesis of HTS oxides will be discussed. The possibility of the deposition of rutile at low temperatures will also be illustrated, and preliminary results for the preparation and characterisation of thin films of silica by atmospheric pressure plasma enhanced CVD will be presented.
9:10 AM B2-1-3 Ti-W-C and Ti-W-C-N Thin Films Deposited by CVD
HuaXia Ji, C.C. Amato-Wierda (University of New Hampshire)
Chemical vapor deposition (CVD) process is widely used to deposit thin films for hard coating industries. TiC and WC are typical hard materials used for cutting tool applications. A gaseous mixture of TiCl4-W(CO)6-CH4-H2-Ar was used to deposit Ti-W-C on stainless steel substrates (440C) by CVD in a horizontal hot-wall reactor at 1050oC. Ti-W-C-N thin films were also deposited from Ti[(CH3)2N)]4- W(CO)6-H2-Ar at 450 and 500oC. The (TiCl4+W(CO)6)/CH4 and W(CO)6/Ti[(CH3)2N)]4 inlet gas ratios were varied for the deposition of the thin films. The characterization of the thin films was carried out using X-ray diffraction (XRD), scanning electron microscopy (SEM), x-ray photoelectron spectroscopy (XPS), and nanoindentation. The XRD analysis of the thin films showed TiC and TiCN to be the main phases in the thin films. The surface morphology of the Ti-W-C films was changed from faceted to rounded particles with increasing W concentration. The Ti-W-C-N films showed a smooth surface. Hardness of the films was measured using nanoindentation. Compositional studies of the films were investigated by XPS. The high resolution XPS revealed the presence of the W binding energy associated with formation of tungsten carbide compounds.
9:30 AM B2-1-4 Growth and Microstructure of the Quaternary Ti-Si-C-N Coatings by CVD
D. Kuo, W. Liao (National Dong Hwa University, Taiwan)
Complex quaternary Ti-Si-C-N coatings obtained by atmospheric pressure chemical vapor deposition with TiCl4, SiCl4, C2H2, NH3, and H2 as reactants have been examined in this study. This study is a further exploitation of Ti-Si-C-N coatings by substituting N2 with NH3 for the purpose of lowering the deposition temperatures. To complete this quaternary coating, step-by-step efforts were executed on three systems: the binary Ti-N, the ternary Ti-Si-N, and the quaternary coatings. Films deposited at 650-800°C appeared to be intact without H2 as the reactant while were broken with H2 added. Films with thickness of 0.1-6µmm were obtained. Growth behaviors of these three systems were discussed. Microstructure was examined by scanning electron microscopy and atomic force microscopy. Composition was determined by electron-probe microanalysis. .
9:50 AM B2-1-5 Deposition Characteristics of Ru Thin Films by Metal-Organic Chemical Vapor Deposition at Low Temperature
K.W. Park, J.H. Choi, Y.K. Han, K.Y. Oh, J. Song (Jusung Engineering Limited, Korea)
The deposition characteristics of Ru thin films, for the application into electrode in MIM capacitor structure, prepared by metal-organic chemical vapor deposition (MOCVD) at low temperature were investigated with the liquid phase of Ru(OD)3 (OD=octanedionate) in methanol solvent as a precursor. The effects of process parameters on morphology and step coverage of Ru films were primarily focused. The surface morphology was improved when either the gas flow ratio of O2 to total gas in chamber or the deposition pressure was decreased. The best surface roughness obtained was about 19.6Å when the gas flow ratio of O2 to total gas was at 10%, which led to very low film resistivity to 46micro- ohm.cm for the films deposited on SiO2. Meanwhile, the property of film step coverage was contrary to the process conditions for improvement of the surface morphology and improved with an increase in O2 gas flow rate. It was also appeared that the film step coverage was mainly influenced by the gas flow ratio of O2 to total gas, deposition pressure, and process temperature. The effects of a seeding layer formed by plasma enhanced CVD (PECVD) prior to deposition of Ru thin films and a rapid thermal anneal (RTN) after the film deposition were studied to improve the surface morphology and the film step coverage The deposition properties of Ru films on various insulator candidates in MIM capacitors such as BST, Ta2O5 and TaON were also extensively examined.
10:10 AM B2-1-6 Kinetics And Mechanism Of The Thermal Decomposition Of Tetrakis(dimethylamino)titanium
C.C. Amato-Wierda, E.T.,Jr. Norton (University of New Hampshire)

Tetrakis(dimethylamino)titanium, TDMAT, is an important precursor for the metal-organic chemical vapor deposition (MOCVD) of TiN and TiSiN thin films, both of which are used as hard coatings. Understanding the kinetics and mechanism of the gas phase reactions in these processes will lead to a better understanding of the CVD process, and an improvement in material properties. As a basis for understanding the CVD of TiN and TiSiN, the focus of this research is on the thermal decomposition of TDMAT alone.

The experiments were performed in a hot-wall LPCVD reactor coupled to a molecular beam sampling system for the quadrupole mass spectrometer (MBMS). The gases are injected into the flow reactor through a temperature controlled, moveable injector. At the end of the reactor a fraction of the gases are sampled and formed into a molecular beam, which passes along the axis of the system to the ion source of the mass spectrometer.

The decomposition follows first order kinetics in the temperature range investigated (333-593K). The activation energy changes from 16 kJ mol-1 at low temperatures to 166 kJ mol-1 at high temperatures, which is indicative of a change in reaction mechanism from a heterogeneous mechanism at lower temperatures to a homogeneous one at higher temperatures. An increase in surface-to-volume ratio (S/V) increases the rate constants for each regime, but does not change the activation energies. The increase in rate constants in the high temperature regime with increased S/V indicates the presence of a surface component at high temperature in addition to the gas phase reaction.

Product species of the decomposition were also monitored. Several possible mechanisms for the gas-phase decomposition reaction have been postulated. Results of comparisons between species present in mass spectral data and those predicted by the mechanisms will be presented.

10:30 AM B2-1-7 Chromium Diffusion Coatings by CVD in Fluidized Bed Reactors (CVD-FBR)
C. Colominas (Grup d'Enginyeria Molecular, Institut Quimic de Sarrià, Spain); A. Sanjurjo, K.H. Lau, P. Jayaweera (SRI International); J. Abellà (Secció de mètodes electromètrics, Institut Químic de Sarrià, Spain)
Chromium diffusion coatings have been obtained by CVD in a Fluidized Bed Reactor (CVD-FBR). Industrial grade metal samples were coated in order to explore the performance of the coating technique on non-homogeneous surfaces. Samples were tested for corrosion resistance by electrochemical impedance spectroscopy and cyclic voltammetry. Main differences between CVD-FBR and classical thermal treatments are emphasized and the potential impact of CVD-FBR technique in the surface treatment business is discussed.
10:50 AM B2-1-8 Chromising of Stainless Steels by the Use of CVD-FBR Technique
F.J. Pérez, M.P. Hierro, F. Pedraza, M.C. Carpintero, C. Gómez (Universidad Complutense de Madrid, Spain)

The use of fossil fuels containing small sulphur, vanadium, etc. may lead to degradation of the boilers and tubes commonly employed in power plants due to the well-known hot corrosion attack. It has been shown that the use of aluminide and chromide coatings are able to extend the service life of the materials employed but whereas the formers do it up to a certain extent, the latters have been shown to protect a further attack of the alloy by forming typically a CrS scale that interferes diffusion of the active species. Austenitic AISI 304 stainless steel may be the material of choice under certain conditions due to its ratio properties/cost. However, the amount of Cr of about 18 wt% may be unsufficient to form, grow and regenerate the protective scales formed upon exposure to the aggresive environment because of the presence of a relative high Ni amount. The use of higher alloyed steels on the contrary makes the prices rise due to the need of a higher Ni content so as to maintain the austenitic structure. Therefore, it could be of interest to increase the amount of Cr on the surface of relatively cheap materials by Surface Engineering.

Either single Cr deposition or Al/Cr or Si/Cr co-deposition has been the goal of different studies mainly on Armco iron, low alloy steels or in Ni-base alloys employing different coating techniques. However, to our belief, very little or no work has been performed on investigating the formation of pure chromide coatings on austenitic stainless using the Chemical Vapour Deposition in Fluidised Bed Reactors (CVD-FBR). Thus, in this work, we will be presenting the results obtained by applying this technique to a commercial austenitic 18Cr-8Ni stainless steel at temperatures ranging from 825 to 900°C using different H2/HCl ratios so as to obtain the best coating quality (i.e. composition and morphology). Attack from HCl to the alloy will be hindered to some extent by increasing the H2 amount in the coating medium. The deposition velocity will be shown to increase with temperature but the quality of the coatings will be inferior to a certain extent. A solution of compromise is therefore found to fulfil all the requirements.

11:10 AM B2-1-9 Chromium and Aluminium Diffusion Coatings Deposited by CVD-FBR and Slurry Into Iron
F.J. Pérez (Universidad Complutense de Madrid, Spain); C. Colominas (Universitat Ramón Llull, Spain); K.H. Lau, A. Sanjurjo (SRI International)
The diffuion of Chromium and Aluminium into Iron has been achieved using chgamical vapor deposition in a fluidized bed reactor and a slurry process, as a new attemp to develop a new competitive method, in comparison with co-deposition methods. The advantageous synergistic effects of these two eleements in minimiing the oxidation and corrosion of steels at high temperatures suggest the use of both elements in diffusion coatings. Diffusion profiles of the coatings reached, jointly with the analysis are shown in this work. The results demostrated the possibility to combine CVD-FBR and slurry processes to produce competitive diffusion coatings
Time Period WeM Sessions | Abstract Timeline | Topic B Sessions | Time Periods | Topics | ICMCTF2001 Schedule