Highly Improved Performance of High Voltage ALD Coated Cathodes Showing Minimal Capacity/Voltage Fade at 4.8V

Physical and Electrochemical Effects of Post-deposition Annealing on Atomic Layer Deposited Al₂O₃ Coatings on LiNi_0.5Mn_0.3Co_0.2O₂

Novel Mechanism of Atomic Layer Deposition Al₂O₃ on LiMn₂O₄ for High Capacity Lithium-ion Batteries

Atomic Layer Deposition of Superionic Solid-State Electrolytes for Lithium Batteries

Cubic Garnet Li₇La₃Zr₂O₁₂ Solid Lithium Electrolyte by ALD

Improving Interfacial Stability of Sulfide-Based Lithium-Ion-Conducting Solid Electrolytes with ALD

Atomic Layer Deposition of Solid-State Electrolytes for All-Solid-State Lithium Ion Batteries

Highly Stable WS₂ Thin Film Anode Grown by Plasma-enhanced Atomic Layer Deposition (PEA LD ) for Na-ion Battery

ALD-Tin Oxide as Impermeable Electron Extraction Layers for Temperature Stable Roll-to-Roll-Compatible Perovskite Solar Cells

Nano-Structured Ceramic ALD Coatings to Stabilize SiC Against Reaction in High Temperature Steam

Mechanical, Physical, and Electrical Properties of Plasma-Enhanced Atomic Layer Deposition of TiVN

ALD as an Enabler of Self-aligned Multiple Patterning Schemes

Thin Film Dopant Sources Grown by PALD for Shallow Semiconductor Doping

Effective Work-Function of PEALD Metal Nitrides and its Tuning by Co-deposition

Surface Morphology, Crystallinity and Electrical Properties of Some Rare-earth Oxide ALD Films

Atomic Layer Deposition of High-k Oxide Films from La(NO₃₃·6H₂O Solution Oxidant

Great Enhancement of Dielectric Constant via High Temperature Annealing ALD Bi-layered Oxides

Atomic Layer Deposition of Novel Interface Layers on III-V Channel Devices

ZrO₂ as a High-k Gate Dielectric for Enhancement-mode AlGaN/GaN MOS HEMTs

Investigation of High-quality Silicon Nitride (SiN_x) Thin Film Grown by Low-temperature Hollow Cathode Plasma-Enhanced ALD as a Gate Dielectric for AlGaN/GaN MIS-HEMTs

Atomic Layer Annealing for Atomic Layer Epitaxy of AlN Ultrathin Films at a Low Growth Temperature

Large Area Spatial Atmospheric ALD

Low Resistivity Titanium Nitride ALD: Low Temperature Enabled by the Use of Ultra-High Purity Hydrazine

Modeling Ampoule Performance for Low Vapor Pressure Precursor Delivery

An innovative chamber designed for ALD, PECVD and FAST^® SiO₂ processes: towards high throughput and conformal deposition at low temperature

Growth Rates During Silicon Spatial Electron-Enhanced Atomic Layer Deposition: Role of Dangling Bond Lifetime

Spatial Atomic Layer Deposition of Gate Encapsulation Silicon Nitride for Self-Aligned Contact Enablement

Fast Atomic Layer Deposition Process for Thin-Film Encapsulation of Organic Light-Emitting Diodes

Flexible Functional Devices at Mass Production Level with the FLEx R2R sALD Platform

All-Organic Spatial MLD: Troubleshooting Deposition onto Porous Substrates

Graphene Oxide Functionalization by Molecular Layer Deposition

Contrast Enhancement of Biological Nanoporous Materials with Zinc Oxide Infiltration for Electron and X-ray Nanoscale Microscopy