HiPIMS and Reactive HiPIMS for Novel Thin Films (TF+SE-MoA)
Monday, Oct 21 2019 1:40PM, Room A215
Moderated by: Joe Becker, Kurt J. Lesker Company; Megan Holtz, Cornell University
Abstracts (Use Expand/Collapse icon in first column to see/hide details)
SchedulePaper #Invited TalkTitle
1:40 PMTF+SE-MoA-1The Influence of the Magnetic Field on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge
2:00 PMTF+SE-MoA-2HIPIMS and Magnetron Sputtering of Niobium for use in Josephson Junctions
2:20 PMTF+SE-MoA-3Thin Film Crystal Growth of Oxides, Nitrides and Carbindes using High Impulse Magnetron Sputtering
3:00 PMTF+SE-MoA-5Reactive Bipolar High Power Impulse Magnetron Sputtering (B-HiPIMS) for Deposition of High Entropy Carbides
3:20 PMTF+SE-MoA-6High Density Titanium Oxide and Silicon Oxide Films Deposited by Current-Controlled High Power Impulse Magnetron Sputtering
4:00 PMTF+SE-MoA-8Epitaxial Growth and Surface Morphology of Thin Film GaN via HiPIMS
4:20 PMTF+SE-MoA-9Reactive HiPIMS Deposition of a Thick Cu:CuCNx Multilayered Nano-composite Coating Material for Improving Machining Process Performance in Rough Turning
4:40 PMTF+SE-MoA-10The Residual Stress Control in Hard Metal Films by Energetic Deposition
5:00 PMTF+SE-MoA-11Advanced HIPIMS Coatings Through Kick Pulse Technology
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