ALD and CVD: Nucleation, Surface Reactions, Mechanisms, and Kinetics (TF+2D+AP+EL+SS-MoA)
Monday, Oct 21 2019 1:40PM, Room A216
Moderated by: Adrie Mackus, Eindhoven University of Technology, The Netherlands; Qing Peng, University of Alabama
Abstracts (Use Expand/Collapse icon in first column to see/hide details)
SchedulePaper #Invited TalkTitle
1:40 PMTF+2D+AP+EL+SS-MoA-1ALD on Particles: What is Different from Wafers?
2:20 PMTF+2D+AP+EL+SS-MoA-3Insights into Particle ALD Peculiarities from In- and Ex-Situ Characterization
2:40 PMTF+2D+AP+EL+SS-MoA-4Impact of Medium Energy Ions on HfO2 Nucleation Mechanisms on Si, SiO2,TiN Substrates in PEALD Processes Investigated by In situ Ellipsometry, Optical Emission Spectroscopy, AFM and XPS Analyses
3:00 PMTF+2D+AP+EL+SS-MoA-5Controlling the Nucleation of CVD Cobalt Films on SiO2 : Combining an Amido-based Nucleation Promotor with an Amine-based Growth Inhibitor to Afford Atomically-smooth Surfaces
3:20 PMTF+2D+AP+EL+SS-MoA-6Plasma-assisted Atomic Layer Epitaxy of Indium Aluminum Nitride Studied Using in situ Grazing Incidence Small-angle X-ray Scattering
4:00 PMTF+2D+AP+EL+SS-MoA-8Real-time Monitoring of the Surface Chemistry of Atomic Layer Deposition by Ambient Pressure X-ray Photoelectron Spectroscopy
4:40 PMTF+2D+AP+EL+SS-MoA-10Kinetics during TMA-H2O ALD: The Possible Role of Cooperative Surface Reactions
5:00 PMTF+2D+AP+EL+SS-MoA-11Atomic Layer Deposition of Metal Sulfides: Growth and Surface Chemistry
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