Commemorating the Career of John Coburn (ALL INVITED SESSION) (PS-WeA)
Wednesday, Oct 23 2019 2:20PM, Room B130
Moderated by: David Graves, University of California at Berkeley; R. Mohan Sankaran, Case Western Reserve University
Abstracts (Use Expand/Collapse icon in first column to see/hide details)
SchedulePaper #Invited TalkTitle
2:20 PMPS-WeA-1INVITED TALK: A Tribute to John W. Coburn
2:40 PMPS-WeA-2INVITED TALK: Interfacial Chemistry in Highly Reactive Systems
3:00 PMPS-WeA-3INVITED TALK: Rare Gas Actinometry Turns Thirty Nine and is Still Finding Applications
3:20 PMPS-WeA-4INVITED TALK: A Leader In Etching (ALE): How John Coburn Paved the way for Atomic Layer Etching
4:20 PMPS-WeA-7INVITED TALK: Materials Processing Using Low Temperature Plasma Surface Interactions: Examples of the Influence of John Coburn
4:40 PMPS-WeA-8INVITED TALK: A Brief Overview on Molecular Dynamics Simulations of Plasma-surface Interaction in Reactive Ion Etching
5:00 PMPS-WeA-9INVITED TALK: Plasma ALD – A Discussion of Mechanisms
5:20 PMPS-WeA-10INVITED TALK: RF Plasmas for Material Etching, Deposition, and Surface Modification
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