Advanced FEOL (PS+EM-TuM)
Tuesday, Oct 22 2019 8:00AM, Room A222
Moderated by: Keren Kanarik, Lam Research Corporation; Alok Ranjan, TEL Technology Center, America, LLC
Abstracts (Use Expand/Collapse icon in first column to see/hide details)
SchedulePaper #Invited TalkTitle
8:00 AMPS+EM-TuM-1Investigation on Plasma Etch Technology Enabling Si/SiGe MOSFET Process Integration
8:40 AMPS+EM-TuM-3Etching of Sub-10 nm Half-pitch High Chi Block Copolymers for Directed Self-Assembly (DSA) Application
9:00 AMPS+EM-TuM-4Mechanism of Highly Selective SiCN Etchings Using NF3/Ar-based Gases
9:20 AMPS+EM-TuM-5Impact of Plasma Process on Source/Drain Epitaxy Film
9:40 AMPS+EM-TuM-6CCP Dry Clean Process Development Using Quadrupole Mass Spectrometer and Optical Emission Spectroscopy
11:00 AMPS+EM-TuM-10Surface Reaction of Atomic Hydrogen with SiGe Surface Compared with Si Through Ab-initio Calculations
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