Surface Reaction Analysis and Emerging Applications of Atomic Scale Processing (AP+BI+PS+TF-WeM)
Wednesday, Oct 23 2019 8:00AM, Room A226
Moderated by: Eric A. Joseph, IBM T.J. Watson Research Center
Abstracts (Use Expand/Collapse icon in first column to see/hide details)
SchedulePaper #Invited TalkTitle
8:00 AMAP+BI+PS+TF-WeM-1Open Spaces in Al2O3 Film Deposited on Widegap Semiconductors Probed by Monoenergetic Positron Beams
8:40 AMAP+BI+PS+TF-WeM-3Surface Reaction Analyses of Atomic-layer Etching by Controlled Beam Experiments
9:00 AMAP+BI+PS+TF-WeM-4Surface Reaction Analysis of Fluorine-based Reactive Ion Etching (RIE) and Atomic Layer Etching (ALE) by Molecular Dynamics (MD) Simulation
9:20 AMAP+BI+PS+TF-WeM-5Analysis of Metal Surface during Atomic Layer Etching with Gas Cluster Ion Beam and Organic Acid
11:00 AMAP+BI+PS+TF-WeM-10Nanoscale Surface Modification of Medical Devices using Accelerated Neutral Atom Beam Technology
11:40 AMAP+BI+PS+TF-WeM-12Chemically Enhanced Patterning of Nickel for Next Generation EUV Mask
12:00 PMAP+BI+PS+TF-WeM-13Surface Reactions of Low Energy Electrons and Ions with Organometallic Precursors and their Relevance to Charged Particle Deposition Processes
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