Surface Mass Spectrometry: SIMS and Beyond (AS-WeA)
Wednesday, Oct 20 2010 2:00PM, Room Cochiti
Moderated by: Christopher Szakal, National Institute of Standards and Technology
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2:00 PMAS-WeA-1Exploring the Surface Sensitivity of ToF-SIMS: Measuring the Implantation Depths and Sampling Depths of Bin and C60 Ion Sources in Organic Films
2:20 PMAS-WeA-2A New Cluster Ion Beam for Advanced Molecular Depth Profiling of Polymers by TOF-SIMS
2:40 PMAS-WeA-3Nanoparticle Surface Analysis by Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) and Low Energy Ion Scattering (LEIS)
3:00 PMAS-WeA-4Dual Beam Depth Profiling of Organic Materials by Time-of-Flight Secondary Ion Mass Spectrometry under Optimized Ion Beam Conditions
4:00 PMAS-WeA-7Fundamental Sputtering Yields of Nanoparticles using SIMS
4:20 PMAS-WeA-8SIMS: Cluster Primary Ion Sputtering - Practical Reference Data and Outlook for High-Resolution Organic Imaging
4:40 PMAS-WeA-9Sample Preparation of Cellular Samples for ToF-SIMS Analysis
5:00 PMAS-WeA-10"Wet SIMS": A Novel Molecular Imaging Technique for Biological Material Analysis
5:20 PMAS-WeA-11Improvement of Organic Ion Yields in Secondary Ion Mass Spectrometry via Water Vapor Injection
5:40 PMAS-WeA-12IonCCDTM for Charged Particle Detection: From sub-keV Electrons and keV Atomic and Molecular Ions to Hyperthermal Biomolecular Ions
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